Damage growth in fused silica optics at 351 nm: refined modeling of large-beam experiments
نویسندگان
چکیده
منابع مشابه
Improving 351-nm damage performance of large-aperture fused silica and DKDP optics
A program to identify and eliminate the causes of UV laser-induced damage and growth in fused silica and DKDP has developed methods to extend optics lifetimes for large-aperture, high-peak-power, UV lasers such as the National Ignition Facility (NIF). Issues included polish-related surface damage initiation and growth on fused silica and DKDP, bulk inclusions in fused silica, pinpoint bulk dama...
متن کاملPolishing-induced contamination of fused silica optics and laser induced damage density at 351 nm.
In this paper we study the effect of contamination induced by fabrication process on laser damage density of fused silica polished parts at 351 nm in nanosecond regime. We show, owing to recent developments of our raster scan metrology, that a good correlation exists between damage density and concentration of certain contaminants for the considered parts.
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26 LLE Review, Volume 77 Deciding when to replace spot-damage-afflicted fused-silica optics or, in the case of inaccessible, space-based lasers, predicting the useful service life of fused-silica optics before catastrophic, pulsed-laser-driven crack growth shatters a part has recently become simpler. By empirically deriving a rule for laser-driven crack growth in fused silica as a function of t...
متن کاملInvestigation of stress induced by CO2 laser processing of fused silica optics for laser damage growth mitigation.
Laser damage mitigation' is a process developed to prevent the growth of nanosecond laser-initiated damage sites under successive irradiation. It consists of re-fusing the damage area with a CO2 laser. In this paper we investigate the stress field created around mitigated sites which could have an influence on the efficiency of the process. A numerical model of CO2 laser interaction with fused ...
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The laser damage precursors in subsurface of fused silica (e.g. photosensitive impurities, scratches and redeposited silica compounds) were mitigated by mineral acid leaching and HF etching with multi-frequency ultrasonic agitation, respectively. The comparison of scratches morphology after static etching and high-frequency ultrasonic agitation etching was devoted in our case. And comparison of...
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ژورنال
عنوان ژورنال: Applied Physics B
سال: 2013
ISSN: 0946-2171,1432-0649
DOI: 10.1007/s00340-013-5555-6